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> How to do this with lithographic processes is an open question

You don't, for economic reasons: the latency of chip manufacturing, i.e. time from initial wafer to finished, is already on the order of weeks. Producing more layers lithographically is going to multiply that latency. Not to mention that it would be a nightmare in terms of yield/manufacturing defects.

What is doable (and already done, I believe) is producing multiple chips in parallel and then stacking them on top of each other. Don't think cores spread across multiple layers; think alternating layers of cores and caches, or a layer of cores with layers of memory stacked on top. (This approach doesn't have the yield problem because you can test the chips before you stack them together. It's a technology that is going to see a lot of improvement still.)

Heat transfer is still a problem, though, simply because the number of transistors scales with the volume, i.e. cubically in the "radius", while the surface area available for heat transfer only scales quadratically.

P.S.: When chip people talk about "metal layers", they mean the layers of wiring (also called the BEOL, back-end-of-line). So increasing the number of metal layers does not actually increase the number of transistors. Also, when chip companies talk about "using N layers" in their current technology, that does not mean that N transistors are stacked on top of each other. It means that there is one layer of transistors, and N layers for connecting wires above.



I wonder when we'll start seeing CPUs with integrated heat pumps. Stacking a Peltier junction as a layer could start to make sense. Or even having (non-conductive) fluidic cooling. (Although you have to be careful designing the chip or else capacitive effects can cause problems)

Also, we currently have a heat ceiling on the order of 10s of watts. An integrated liquid-cooled heat sink could drastically up that, at least for server-like applications.




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