They can do 7nm and 5nm. Multiple patterning basically. I don't know when it doesn't scale anymore. Moat likely 4x patterning is the max you want to do.
If you didn't care about exposure time, you could build 2nm chips with brute-force electron beam lithography. But the limited throughput confines EBL to research and very low-volume applications. ASML's EUV-based processes are what permit industrial-level scaling, ultimately because parallel beams of electrons repel each other while parallel beams of photons don't.
I don't personally understand why suitable EUV light sources are so hard to build, but evidently, they are. It sounds like a big deal if China is catching up in that area.
I wish agentic skills were something other than a system prompt or a series of step-by-step instructions. feels like anthropicide and opportunity here to do something truly groundbreaking but ended up with prompt engineering.
Realistically you aren't their target market. They're targeting the enterprises who already have self hosted runners and aren't interested in switching to Actions minutes.
Indeed. The whole AI game is predicated on the fact that they can deliver work equivalent to humans in some cases. If that is never going to be the case, then this whole agentic stuff goes belly-up.
The alternative scenario is they get better and do some work really well. That is an interesting territory to focus on.
super amazing demo performance being able separate out music voice and background noises. do you have to explicitly specify what type of noise to separate?
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